Application of ultra-vacuum technology in materials science
Ultra-vacuum, as the name suggests, is a special environment beyond the normal vacuum state. In physics, a vacuum is usually defined as a state of space in which no matter exists. Ultra-vacuum, however, builds on this and elevates the degree of vacuum to a higher level, reaching a point where almost all matter particles and energy fluctuations are completely excluded.
Ultra high vacuum applications
Ultra-high vacuum applications are very broad, and here we list the most closely related to surface physics research, including magnetron sputtering, laser pulse deposition, molecular beam epitaxy, surface analysis and particle accelerators.
1. Physical research
In physics research, supervacuums are necessary for high-precision experiments. For example, in quantum mechanical experiments, supervacuo can reduce external interference and allow scientists to observe and study quantum phenomena more accurately. In addition, the supervacuum can be used to study the surface properties of matter, the behavior of atoms and molecules, etc.
Ultra-high vacuum technology is widely used in the field of molecular beam epitaxy and surface analysis, and various types of molecular beam epitaxy devices, photoelectron spectroscopy, and fabrication characterization systems such as scanning tunneling microscopy operate in this range. Because the vacuum system often occupies a considerable proportion of the system construction cost, how to choose the right pump set and obtain the best vacuum as quickly as possible through the right way is a common problem in the related field.
Particle accelerators have the most demanding vacuum requirements, but because of the high cost of the overall system, the vacuum pump group is not the main component of the cost. Generally, the best vacuum pump is equipped as far as possible. In addition, there is generally no pollution source in the cavity of the accelerator, and the vacuum degree usually reaches the range of extremely high vacuum.
Magnetron sputtering due to the mechanism of the problem, the pollution generated in the process of evaporation is large, usually will not pursue a particularly high vacuum, the general use of molecular pump set can meet the conditions. In recent years, with the continuous progress of technology and the further development of research needs, the vacuum degree of magnetron sputtering system continues to improve, and ultra-high vacuum related technology is also constantly entering this field.